Researchers were exploring new uses for thin film transistors (TFT), which are most commonly found in low-power, low-frequency devices like a computer display screen.
Efforts to improve the performance of transistors have been slowed by the challenges of developing new materials or slowly improving existing ones for use in traditional thin film transistor architecture, known as the metal oxide semiconductor field effect transistor (MOSFET).
Instead of developing new materials, researchers from the University of Alberta in Canada improved performance by designing a new transistor architecture that takes advantage of a bipolar action.
Their first breakthrough was forming an 'inversion' hole layer in a 'wide-bandgap' semiconductor, which has been a great challenge in the solid-state electronics field.
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"Once this was achieved, we were able to construct a unique combination of semiconductor and insulating layers that allowed us to inject 'holes' at the MOS interface," said Gem Shoute from University of Alberta.
Adding holes at the interface increased the chances of an electron 'tunneling' across a dielectric barrier. Through this phenomenon, a type of quantum tunnelling, researchers were able to achieve a transistor that behaves like a bipolar transistor.
The dimension of the device itself can be scaled with ease in order to improve performance and keep up with the need of miniaturisation, an advantage that modern TFTs lack. The transistor has power-handling capabilities at least 10 times greater than commercially produced thin film transistors.
"Usually tunnelling current is considered a bad thing in MOSFETs and it contributes to unnecessary loss of power, which manifests as heat," said Shoute.
The findings were published in the journal Nature Communications.